Oxford Plasmalab 80
- One controller for both RIE and PECVD
- PECVD Capabilities
- Amorphous Si
- Si3N4
- SiONx
- SiO2
- PECVD Source Gases Available
- SiH2, O2, N2, N2O, H2
Process Information
Oxford 80+ Characterization Results Summer 2010 Etch Rates and Process Parameters