XPS, Kratos Axis Ultra DLD
This system is a state-of-the-art multitechnique surface analysis tool. The system measures the chemical composition and bonding of a surface, and can also perform depth profiles which look at the composition below the surface to limited depths. The system has been acquired through generous funding from an NSF Chemistry Research Instrumentation grant (CHE-0443657) and matching funds from the University of Utah Office of the Vice-president for Research.
Instrument Capabilities
X-Ray Photoelectron Microscopy (XPS) and Imaging XPS
- Monochromatic X-ray source Al and Ag
- Achromatic X-ray source Al and Mg
- Small spot analysis to 15 microns
- Angle-resolved XPS
Auger Electron Spectroscopy (AES)
- Field-emission electron source
- 100 nm spot size
- Scanning electron microscopy (SEM)
- Scanning Auger microscopy (SAM)
Ion Scattering Spectroscopy (ISS/LEIS)
- Helium ion beam source
- Bipolar Hemispherical analyzer
- Probes the top monolayer
Depth Profiling
- Argon ion beam
Electron and Ion Dispersion
- Combined Hemispherical Analyzer and Spherical Mirror Analyzer
- Microchannel plate electron multiplier
- Delay-line detector array
Vacuum/Gas Analysis
- MKS Quadrupole Mass Spectrometer
- Located in the Sample Transfer Chamber (STC)
Sample Control and Requirements
- Positioning in X, Y, and Z by Automated manipulator
- Rotation on manipulator axis for Angle Resovled
- Temperature control from 77 K (LN2) to 600 K (in situheating)
- Azimuthal rotation for precision depth profiles
- Non-outgassing solid material
- Ultrahigh vacuum compatible
- Sample size of 1 x 1 cm2
CasaXPS Software
- Contact Brian Van Devenerfor the university's site license
- The zip file contains the executable together with default library (based on Scofield cross-sections), HTML help manual and configuration files (~25Mb)
Documentation
Last Updated: June 30, 2010