NanoFrazor
  • Introduction
  • Safety Instructions
  • Quick Start
    • Set up the System
    • Configure the System
    • Define Layout
    • Perform Lithography
  • Technology Reference
    • Operations
      • Surface Approach
      • Temperature Calibration
      • Reading
      • Writing
      • Write-Read Alignment
      • Depth Feedback
    • Cookbook
      • 3D Patterning
      • High Resolution Patterning
      • Overlay
    • Troubleshooting
      • Jumps in Measured Depth
      • Target Depth Not Reached
      • Divergence of the patterned depth
      • Big Hole
  • Hardware Reference
    • Housing
    • Working Compartment
    • Storage Compartment
    • Electronics Compartment
    • Gas Compartment
    • Installation
    • Cantilever Replacement
  • Software Reference
    • Getting Started
    • Graph Tools
    • Configuration
      • Sample
      • Cantilever
      • IV Curve
      • Cantilever Sensors
      • Piezo Approach
    • Layout Editor
      • Image Import
      • GDS Import
      • Layout
    • Session
      • Floorplan
      • CLL Runtime
      • Trajectory
      • Level Plane
      • CLL Forces
    • Utilities
      • Logs
      • Lights
      • Valves
      • Environment
      • Microscope
      • Stage
      • Electronics
      • USB
      • Settings
  • Scripting
    • Getting Started
    • MAO Framework
    • API Functions
    • Script Examples
    • Tutorial: Analysis of a script
    • Tutorial: Development of a script
  • Processes
    • PPA handling
    • Simple lift-off for > 20 nm resolution
    • 3D etch into silicon
    • High Resolution Processes
  • Changelog
  • Contact Us
 
NanoFrazor
  • Docs »
  • IMPLEMENTATION

IMPLEMENTATIONΒΆ

  • NF XOP Implementation
  • NF LIB Implementation
  • NF CCS Implementation
  • NF ARD Implementation

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