Frequently asked questions¶
For the online version, see also here.
Q: Can you write as fast as an e-beam? A: Yes and no. At high resolution, our write speed is similar to that of an e-beam, which has to use high-dose resists like HSQ. E-beam can be faster for low resolutions, if a chemically amplified resist is allowed. In any case, overall production time can be shortened by the NanoFrazor, as resist development and quality inspection is already integrated in the writing process.
Q: How long does it take to write 1 mm2 with the NanoFrazor Explore? A: The NanoFrazor process is around 1,000 times faster than common AFM lithography techniques like anodic oxidation or dip pen lithography, because a single pixel can be written in microseconds instead of milliseconds. Depending on the pixel size and the number of lines to write, it can still take a few hours to write 1 mm2.
Q: What are the fundamental limitations for the speed? A: The maximum speed is determined by the minimal reaction time at tip/sample contact (around 1 µs for PPA) and the maximum controllable vertical frequency of the cantilever (500 kHz demonstrated).
Q: What’s the smallest feature size you can write? A: So far, the best resolution which has been demonstrated was 8 nm lines and spaces.
Q: What are the fundamental limitations for the resolution? A: The minimal feature size is determined by the tip radius, the molecular size and mechanical stability of the resist.
Q: Are your cantilevers/tips consumables? A: Yes. They are easy to replace and can be interchanged in less than a minute.
Q: What’s the tip lifetime? A: Tips can last up to a few days, depending on usage scenario and the required resolution. The tips durability is affected by hard sample materials or contamination from either impure resists or the environment.
Q: Is resist development required? A: No. This actually saves a lot of turnover time to discover and fine-tune the right parameters for rapid prototyping.
Q: Will there be any remnants of the polyphthalaldehyde (PPA)? A: No. The PPA fully decomposes into small monomers which evaporate.
Q: What wafer sizes can the NanoFrazor Explore handle? A: The NanoFrazor Explore typically writes on small samples (about 20 mm × 20 mm). Larger workpieces of up to 4-inch wafers are also possible, but at a slightly reduced scanner performance. The tip can reach any location within a 100 mm x 100 mm area.
Q: How big is the write field of the NanoFrazor Explore? A: The NanoFrazor Explore has a piezo scanner with a scan range of 75 μm x 75 μm.
Q: Do you need a vacuum or a clean-room for the NanoFrazor Explore? A: No vacuum or even a clean-room is required to create high-resolution 3D structures.