DRIE, ICP RIE, XeF2 dry silicon isotropic, or wet chemical acid/base thick or thin film etching

How to Have Your Thin Film or Substrate Etched/Patterned

  • Contact Nanofab Cleanroom staff with etching details (material to be etched, etch depth, substrate/part material and size and quantity, any lithography needed) https://www.nanofab.utah.edu/lab-staff/#process (Brian Baker)
  • Staff will examine your requirements and give you an estimate for etching/patterning time and cost
  • Set up a Nanofab account (https://workauth.cores.utah.edu/#/offcampus)
  • Ship your substrates to Nanofab Cleanroom staff 
  • After you approve/authorize the process, staff will etch/pattern your substrate/part and ship it back to you
Multi-Level Si Etching