Tool Owner
Joe Jacob (joseph.jacob@utah.edu)
Reservations Calendar
DWL 66+ System Specifications
Resolution
- High Resolution write head: 300nm
- 5mm write head: 800nm
Write Time for 100mm wafer or photomask
- Hi-Resolution: 2 days
- 5mm write head: 4 hours
Grayscale direct writing
Substrates up to 200mm wafer diameters and 9″x9″ photomasks
Pneumatic and optical autofocus (OAF works only with reflective substrates, transparent substrates only work with pneumatic)
