Oxford Plasmalab 80 PECVD

October 20, 2022

Tool Owner

Joseph Jacob (joseph.jacob@utah.edu)

Reservations Calendar

S/N: 9M69591A

This is a placeholder for the Oxford Plasmalab 80 as a PECVD tool.

  • One controller for both RIE and PECVD
  • PECVD Capabilities
    • Amorphous Si
    • Si3N4
    • SiONx
    • SiO2
  • PECVD Source Gases Available
    • SiH4, N2, N2O, NH3, Ar

Process Information

Oxford 80+ Characterization Results Summer 2010 Etch Rates and Process Parameters

PECVD SiO2 Der Rate Chart

Download Files

Files

SOP:

Oxford 80 pecvd SOP

Spec Sheet:

plas_80.pdf

Staff Files

Manual:

ENI CAL

Run-Data Reports for Oxford Plasmalab 80 PECVD

Processes on Oxford Plasmalab 80 PECVD

Download Combined Report (XLS)