Tool Owner
Jim Pierce (jim.pierce@utah.edu)
Reservations Calendar
General Description
Atmospheric furnace with Nitrogen, Oxygen, and water. It can be used for dry oxidation, wet oxidation, anneal, boron solid source doping, and phosphorous solid source doping. This furnace is used to dope wafers or to process wafers previously doped.
Dopant solid sources are products from Techneglas: GS-139 for Boron and TP-470 for Phosphorous. Product literature is found in the Files below.
Files
SOP:
ProTemp Furnace Operating Instructions
Techneglas Solid Source Information
Boron
BoronPlus Source Preparation: Cleaning
BoronPlus Etch Stop Application
BoronPlus Moisture-Enhanced Evolution Rate
Phosphorous
PhosPlus Source Preparation: Cleaning
General Information
Staff Files
SOP:
Run-Data Reports for ProTemp Doped Ox
| Processes on ProTemp Doped Ox | |||
|---|---|---|---|
| aborted | |||
| protemp-clean-ox-process | |||
| protemp-doped-ox-anneal-process | |||
| protemp-doped-ox-doping-process | |||
| protemp-doped-ox-process | |||
| protemp-dry-oxidation-process | |||
| protemp-wet-oxidation-process | |||
| service | |||
| runs-without-data | |||
| Download Combined Report (XLS) |